![]() Cathode-ray tube
专利摘要:
The present invention provides an improved cathode-ray tube of a type having a cathodoluminescent line screen and slit apertured mask mounted within the tube in spaced relation to the screen, wherein the slits in the mask are aligned in substantially parallel columns, each column containing a plurality of slits which are vertically separated by web portions of the mask. In the tube, some of the end portions of the aperture columns are modified to produce a more asthetically pleasing screen border. 公开号:SU1189357A3 申请号:SU792848498 申请日:1979-11-30 公开日:1985-10-30 发明作者:Хьюг Годфри Ричард;Озмун Рек Джеймс 申请人:Рка Корпорейшн (Фирма); IPC主号:
专利说明:
The invention relates to cathode-ray tubes with cathodoluminescent linear screens and slit-type masks, and more specifically to a screen design of an enhanced visual reception. The aim of the invention is to improve the image quality at the edge of the screen. FIG. 1 depicts an electron-beam tube with a slit mask, axial section; in fig. 2 - the mask and the front plane of the cathode ray tube from the side of the neck of the tube (section in Fig. 1); in fig. 3 shows the node J in FIG. 2; in fig. 4 same, option J in FIG. 5 and 6 are enlarged views of portions of the photomasks for exposing the opposite sides of the shadow masks designed in accordance with the invention. FIG. Figure 1 shows a rectangular color kinescope consisting of a vacuum glass shell 1 comprising a rectangular panel 2 and a cylindrical mouth 3. Connected by a conical neck 4. The interior view of the panel is shown in FIG. 2. Panel 2 consists of a front view plane 5 and a peripheral flange or side wall 6, which are hermetically connected to the neck 4. A mosaic three-branch line cathodoluminescent screen 7 is located on the inner surface of the front plane 5 and consists of an array of phosphorous lines located along essentially parallel to the vertical axis (YY) .pipe. The area between the cathode luminescent lines can be filled with a light absorbing material. Inside panel 2, in a given spatial dependence on screen 7, a multi-aperture color selection electrode or a shadow mask are movably mounted (shown schematically). The mask 8 contains a plurality of openings (apertures) in the form of a slit, arranged in one line substantially parallel to the vertical columns. Each column contains a multitude of slots, which, in their verticals, are separated from each other in the mask by sections of jumpers. The jumper portions in the adjacent columns are arranged vertically in a checkerboard pattern. A linear electron gun 9 (shown schematically) is mounted inside the neck 3 to form and direct three electron beams 10 along coplanar converging paths through mask 8 to screen 1. The tube in FIG. 1 is designed for use with an external magnetic deflecting coil 11 placed on the neck 3 and the socket in the area of their direct connection. When a corresponding voltage is applied to the coil 11, the three electron beams 10 are exposed to a magnetic field in the vertical and horizontal directions, which causes the vertical and horizontal scanning of the rays on a rectangular raster within the screen. To simplify, the actual curves of the paths of the deflected rays in the deflection zone in FIG. 1 not shown. Instead, it is schematically shown that the rays instantaneously bend in the plane of the P-P deflection. FIG. 3 shows a mask 12 with an aperture of a known tube with a partial section for showing a portion of the screen 13 of the tube The mask 2 contains a plurality of slotted holes (apertures) 14 located on one straight line in columns 15. Except for some apertures 16 near the periphery of the mask, all slot apertures are equal in length. Each aperture 14 in each column 15 is separated from the neighboring aperture B of the same the column itself is a mask mask section. These portions of the lane are essentially equal in length to the aperture measured in the longitudinal direction of the click. The distance between the centers of successive portions of the jumpers 17 in the same column is the jump step H. This jumper repetition distance is maintained throughout the mask. Due to the patterned repetition of the jumper and the need to have screen boundaries parallel to smooth transitions of the contours of the upper and lower parts of panel 2 and mask 12, the marked boundary line usually cuts off columns of apertures at aperture locations, and also periodically cuts the jumper or is close enough to the jumper so that an unsatisfactory aperture is obtained model with full etching. Such copied but not etched apertures are indicated by the dashed positions 18 and 19 in FIG. 3. Since the Mac is used as a photocable for the formation of a screen, the effect that the required boundary line has on passing through or near the jumper section is to form a screen with an irregular serrated upper and lower boundary. An example of this irregular boundary is shown in FIG. 3, in which the three lines 20 end at a lower point than the adjacent three lines 21 end, since the partial aperture 19 (shown by dotted lines) is not opened by etching,. The section of the improved tube having a regular upper and lower smooth contour. The border of the screen in accordance with the invention is shown in FIG. A, Mask 22 has the same aperture slot configuration for the most part of the mask, as mask 12 of FIG. 3, except that the aperture model of some columns is modified in the upper and lower periphery to provide all aperture columns with full width, and aperture slots - adjoining the required boundary line. The mask 22 contains a plurality of slotted apertures 23 located on the same straight line in columns 24 with apertures 23 in each column, separated by bridges 25 The space between the centers of the bridges 25 in the main central part of the mask 22 is the bridges step H In this embodiment, all the bridges the centers that could be within half the repetition distance of the jumper from the required boundary line are missing. Actually, in the perkop of drawing the aperture template and creating a photomask that is used in the screen photoexposure, any jumpers that have centers that will be formed either half N inside the border or half N beyond the border, and, if the aperture pattern goes beyond the border, skipped. Jumper patterns that extend beyond the boundary are skipped because the boundary patterns can be smoothly shifted, thereby creating an interruption of the boundary line by columns, as well as protection from narrowing at the ends of the aperture slots when exposed to the boundary line of the screen contour. Removing jumpers from the nearest edge of the aperture pattern ensures that all columns have a full width of the end of the apertures that extend to the upper and lower required border lines. Since the aperture columns end in a smoothly delineated line, the resulting screen 26 also has smoothly delineated upper and lower limits (Fig. 4). Although this jumper repetition distance is constant, it is clear that the invention also covers options in which the jumper repetition distance can vary smoothly within the mask, it has particular problems. Moreover, this invention relates to a tube having located columns of apertures, it is also applicable to a tube having horizontally arranged columns of slotted apertures. A shadow mask is typically constructed with aperture holes on the screen side of the mask that are larger than the aperture holes on the mask from the side of the electron gun. Such apertures are formed by first coating a sheet of non-etched mask material with a photosensitive coating, and then photo-exposing the coating through interconnected photomasks on opposite sides of the sheet. Then, the coating appears and the sheet is etched to form; apertures FIG. 5 and 6 show the patterns 27 and 28 of the apertures of the photomasks 24 and 30 of the shadow mask, respectively, used to expose the opposite sides of the shadow mask. Pattern 27 (FIG. 5) is the aperture holes that must be mounted on the mask from the electron gun side, and pattern 28 (Fig. 6) - holes of the apertures, which must be mounted on the mask from the screen. The border of the matrix. the apertures are shown by line 31. In the template 37 from the side of the electron gun, the template elements terminate along the boundary line 31, and in the template 28 from the screen side, the template elements extend beyond the boundary line 31. The target of the expansion of the template matrix on one side of the mask beyond the intended area apertures is a formation. darken masked cuts to reduce stress in the domed shape. By weakening the peripheral area, i.e., the outer aperture matrix, a certain reduction in voltage on the webs, masks, as well as a decrease in the likelihood of the webs breaking during the formation of the mask, is achieved. According to FIG. 5 and 6, the hatching line 32 within the boundary line 31 represents the half-step jumper space. In addition, between the dashed line 32 and the border line 31, the centers of the jumpers are not located, thus providing a smooth contour around the periphery of the aperture matrix. Locations where jumpers should be in a known tube having a fixed jump distance are indicated by reference number 33. However, it has been found that removing some jumpers in this peripheral area creates some difficulties, in particular, by extending the end of the aperture by removing the jumper There is an excessive distortion of the aperture during the formation of the mask into a dome shape. Consequently, in order to compensate for this deformation, additional bridges 34 were added to the template, namely from the outer side within half a distance; nor the repetition of the jumper. Usually, if the jumper center is located between 1.1 and 1.5 jumper steps from the 5 line of the border 31, then the jumper should be added. In embodiment 5 and 6, the limits 1.1-1.5 are indicated by lines 35 and 36, respectively. Extra jumpers 34 added to 0 center. Elongated aperture gap. The vertical size of the added jumpers 34 is approximately equal to half the vertical size of the correct jumper. /. 5 In the expanded mask model from the side of the screen (Fig. 6), the same criteria are used to move the template jumper, which are applied within the border 31, except for the angles that will be considered. Moving the template jumpers towards expansion is necessary in order to prevent some of the jumpers from forming at the border 31, thereby affecting the shape and length of the aperture at the border 31. In FIG. 6, reference numeral 37 denotes template jumpers moved within half of the distance 38 of the jumper beyond the border 31. The main problem of re-relaxation occurs in the corners of the mask if the template jumpers are moved from the extended template. Therefore, in order to compensate for such a re-attenuation, pembyki are added to the extended pattern at the corners of the mask on the border 31 of the aperture pattern (Fig. 6). u ////////// 7 //// 9 / /five Fig.Z
权利要求:
Claims (1) [1] ELECTRON BEAM TUBE containing a linear cathodoluminescent screen and a mask installed in front of the screen and having slotted openings separated by jumpers and arranged in parallel columns, with the jumpers of adjacent columns staggered relative to each other and the ends of all columns located along the boundary smooth curves, characterized in that, in order to improve the quality of the image on the screen border, the boundary slotted holes in the columns are made of variable length, at which the distance from g the jumper to the nearest jumper in the column is selected in the range from 0.5 to 1.1 jumper steps. Priority by signs: 06/11/79 - the distance from the boundary jumper to the nearest jumper in the column is selected no more than 1.1 jumper steps; 30.11.78 - all other signs of a distinctive part of the claims. (L s 1 189357
类似技术:
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同族专利:
公开号 | 公开日 US4300070A|1981-11-10| PL131333B1|1984-10-31| FR2443135A1|1980-06-27| FR2443135B1|1984-12-28| BR7907264A|1980-07-22| CA1147009A|1983-05-24| IT7927045D0|1979-11-05| HK62787A|1987-09-04| IT1124917B|1986-05-14| GB2038542B|1983-03-02| GB2038542A|1980-07-23| DE2948361A1|1980-06-04| DE2948361C2|1985-08-08| PL220029A1|1980-08-11|
引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题 JPS5129635B2|1971-09-21|1976-08-26| FR2171181B1|1972-02-07|1976-11-05|Hitachi Ltd| US3766419A|1972-11-10|1973-10-16|Rca Corp|Cathode-ray tube with shadow mask having random web distribution| NL7303077A|1973-03-06|1974-09-10| JPS5750337B2|1975-08-18|1982-10-27| US4210842A|1975-09-10|1980-07-01|Hitachi, Ltd.|Color picture tube with shadow mask| JPS584425B2|1976-04-14|1983-01-26|Hitachi Ltd| DE2656995C2|1976-12-16|1983-12-01|Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt|Rectangular color selection mask for a color cathode ray tube| DE2841286A1|1978-09-22|1980-04-10|Licentia Gmbh|TV colour CRT with rectangular screen - has colour selection mask with slots limited at top and bottom by curved lines also limiting screen area|NL8104894A|1981-10-29|1983-05-16|Philips Nv|COLOR IMAGE TUBE.| SU1461377A3|1984-05-25|1989-02-23|Рка Корпорейшн |Colour kinescope| US4631440A|1985-04-29|1986-12-23|North American Philips Consumer Electronics Corp.|Color cathode ray tube having smooth screen edges| GB8708574D0|1987-04-10|1987-05-13|Philips Nv|Colour cathode ray tube| US5030881A|1990-07-02|1991-07-09|Rca Licensing Corporation|Color picture tube with shadow mask having improved aperture border| US5583391A|1995-11-15|1996-12-10|Thomson Consumer Electronics, Inc.|Color picture tube shadow mask having improved mask aperture pattern| KR100389540B1|2001-01-31|2003-06-27|주식회사 엘지이아이|Color cathode-ray tube containing improved slot shape of shadow mask|
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申请号 | 申请日 | 专利标题 US96524078A| true| 1978-11-30|1978-11-30| US06/047,218|US4300070A|1978-11-30|1979-06-11|Cathode-ray tube screen border improvement| 相关专利
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